Item Details

Optical Microlithography XXVII [electronic resource]: 25-27 February 2014

Kafai Lai, Andreas Erdmann, editors ; sponsored by SPIE ; cosponsored by Cymer, an ASML company
Format
EBook; Book; Online
Published
Bellingham, WA : SPIE, [2014]
Language
English
Series
Proceedings of SPIE
SPIE Advanced Lithography
ISBN
9780819499752
Description
Mode of access: World wide Web.
Notes
Includes bibliographical references and index.
Series Statement
Proceedings of SPIE, 0277-786X ; volume 9052
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

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