Item Details

Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions

edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood
Format
Book
Published
Park Ridge, N.J., U.S.A. : Noyes Publications, c1990.
Language
English
Series
Materials Science and Process Technology Series
ISBN
0815512201
Description
xxiii, 523 p. : ill. ; 25 cm
Notes
Includes bibliographical references and index.
Technical Details

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    a| Handbook of plasma processing technology : b| fundamentals, etching, deposition, and surface interactions / c| edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
    260
      
      
    a| Park Ridge, N.J., U.S.A. : b| Noyes Publications, c| c1990.
    300
      
      
    a| xxiii, 523 p. : b| ill. ; c| 25 cm
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    a| Materials science and process technology series
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    a| Includes bibliographical references and index.
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    a| Plasma engineering.
    650
      
    0
    a| Semiconductors x| Etching.
    650
      
    0
    a| Plasma etching.
    700
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    a| Rossnagel, Stephen M.
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    a| Cuomo, J. J.
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    a| Westwood, William D. q| (William Dickson), d| 1937-
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    a| TA2020 .H37 1990 w| LC i| X002280912 k| CHECKEDOUT l| STACKS m| SCI-ENG t| BOOK

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