Item Details

Metrology, Inspection, and Process Control for Microlithography XXI [electronic resource]: 26 February- 1 March 2007, San Jose, California, USA

Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA)
Format
EBook; Book; Online
Published
Bellingham, Wash. : SPIE, c2007.
Language
English
Related Title
SPIE digital library.
Series
Proceedings of SPIE
ISBN
9780819466372, 0819466379
Description
Mode of access: World wide Web.
Notes
Includes bibliographical references and author index.
Series Statement
Proceedings of SPIE, 0277-786X ; v. 6518
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

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