Item Details

Photomask and X-Ray Mask Technology VI [electronic resource]: 13-14 April, 1999, Yokohama, Japan

Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.]
Format
EBook; Book; Online
Published
Bellingham, Wash., USA : SPIE, c1999.
Language
English
Series
SPIE Proceedings Series
Proceedings of SPIE — the International Society for Optical Engineering
ISBN
081943230X
Description
Mode of access: World wide Web.
Notes
Includes bibliographical references and index.
Series Statement
SPIE proceedings series ; v. 3748
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3748
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

  • LEADER 01838nam a2200433 a 4500
    001 u6767861
    003 SIRSI
    005 20160608063142.0
    006 m d
    007 cr n
    008 000807s1999 waua sb 101 0 eng d
    010
      
      
    a| 00699160
    020
      
      
    a| 081943230X
    035
      
      
    a| (Sirsi) ssj0001233145
    035
      
      
    a| (WaSeSS)ssj0001233145
    040
      
      
    a| CUS c| CUS d| OCL d| DLC d| WaSeSS
    042
      
      
    a| lccopycat
    050
    0
    0
    a| TK7872.M3 b| P4724 1999
    082
    0
    0
    a| 621.3815/31 2| 21
    245
    0
    0
    a| Photomask and X-ray mask technology VI h| [electronic resource] : b| 13-14 April, 1999, Yokohama, Japan / c| Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.].
    260
      
      
    a| Bellingham, Wash., USA : b| SPIE, c| c1999.
    490
    1
      
    a| SPIE proceedings series ; v| v. 3748
    504
      
      
    a| Includes bibliographical references and index.
    538
      
      
    a| Mode of access: World wide Web.
    650
      
    0
    a| Masks (Electronics) v| Congresses.
    650
      
    0
    a| Integrated circuits x| Masks v| Congresses.
    650
      
    0
    a| X-ray lithography v| Congresses.
    650
      
    0
    a| Microlithography v| Congresses.
    650
      
    0
    a| Optoelectronic devices x| Design and construction v| Congresses.
    655
      
    0
    a| Electronic books.
    700
    1
      
    a| Morimoto, Hiraoki.
    710
    2
      
    a| Photomask Japan.
    710
    2
      
    a| BACUS (Technical group)
    710
    2
      
    a| Ōyō Butsuri Gakkai.
    710
    2
      
    a| SPIE Conference Proceedings by volume
    830
      
    0
    a| Proceedings of SPIE--the International Society for Optical Engineering ; v| v. 3748.
    856
    4
    0
    u| http://RE5QY4SB7X.search.serialssolutions.com/?V=1.0&L=RE5QY4SB7X&S=JCs&C=TC0001233145&T=marc
    596
      
      
    a| 1
    999
      
      
    a| TK7872 .M3 P4724 1999 w| LCPER i| 6767861-1001 l| INTERNET m| UVA-LIB t| INTERNET

Availability

Read Online