Item Details

Photomask and X-Ray Mask Technology IV [electronic resource]: 17-18 April, 1997, Kawasaki, Japan

Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering
Format
EBook; Book; Online
Published
Bellingham, Washington : SPIE, c1997.
Language
English
Variant Title
Photomask and X-ray mask technology 4
Photomask and X-ray mask technology four
Series
Proceedings / SPIE — the International Society for Optical Engineering
Proceedings of SPIE — the International Society for Optical Engineering
ISBN
0819425168
Description
Mode of access: World wide Web.
Notes
Includes bibliographic references and author index.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering ; v. 3096
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3096
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

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