Item Details

Photomask and Next-Generation Lithography Mask Technology XIV [electronic resource]: 17-19 April 2007, Yokohama, Japan

Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
Format
EBook; Book; Online
Published
Bellingham, Wash. : SPIE, c2007.
Language
English
Related Title
Photomask and X-ray mask technology
Series
Proceedings of SPIE
Proceedings of SPIE — the International Society for Optical Engineering
ISBN
9780819467454 (pbk.), 0819467456 (pbk.)
Description
Mode of access: World wide Web.
Notes
  • Some earlier proceedings have title: Photomask and X-ray mask technology.
  • Includes bibliographical references and author index.
Series Statement
Proceedings of SPIE, 0277-786X ; 6607
Proceedings of SPIE--the International Society for Optical Engineering ; v. 6607
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

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