Item Details

Metrology, Inspection, and Process Control for Microlithography XVII [electronic resource]: 24-27 February, 2003, Santa Clara, California, USA

Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
Format
EBook; Book; Online
Published
Bellingham, Wash. : SPIE, c2003.
Language
English
Series
SPIE Proceedings Series
Proceedings of SPIE — the International Society for Optical Engineering
ISBN
0819448435
Description
Mode of access: World wide Web.
Notes
Includes bibliographical references and author index.
Series Statement
SPIE proceedings series ; v. 5038
Proceedings of SPIE--the International Society for Optical Engineering ; v. 5038
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

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