Item Details

Metrology, Inspection, and Process Control for Microlithography XVI [electronic resource]: 4-7 March, 2002, Santa Clara, [California] USA

Daniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
Format
EBook; Book; Online
Published
Bellingham, Washington : SPIE, c2002.
Language
English
Series
SPIE Proceedings Series
Proceedings of SPIE — the International Society for Optical Engineering
ISBN
0819444359
Description
Mode of access: World wide Web.
Notes
Includes bibliographical references and author index.
Series Statement
SPIE proceedings series ; v. 4689
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4689
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

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