Item Details

Extreme Ultraviolet (EUV) Lithography II [electronic resource]: 28 February-3 March 2011, San Jose, California, United States

Bruno M. La Fontaine, Patrick P. Naulleau, editors ; sponsored by SPIE ; cosponsored by Clymer, Inc
Format
EBook; Book; Online
Published
Bellingham, Wash. : SPIE, c2011.
Language
English
Series
Proceedings of SPIE
Proceedings of SPIE — the International Society for Optical Engineering
ISBN
9780819485281 (pbk.), 0819485284 (pbk.)
Description
Mode of access: World wide Web.
Notes
  • "SPIE advanced lithography" --Cover.
  • Includes bibliographical references and author index.
Series Statement
Proceedings of SPIE, 0277-786X ; v. 7969
Proceedings of SPIE--the International Society for Optical Engineering ; v. 7969
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

  • LEADER 01851nam a22004457a 4500
    001 u6755620
    003 SIRSI
    005 20160608063142.0
    006 m d
    007 cr n
    008 120313s2011 waua sb 101 0 eng d
    010
      
      
    a| 2012360647
    016
    7
      
    a| 015848633 2| Uk
    020
      
      
    a| 9780819485281 (pbk.)
    020
      
      
    a| 0819485284 (pbk.)
    035
      
      
    a| (WaSeSS)ssj0000629182
    040
      
      
    a| UKMGB c| UKMGB d| CAI d| DLC d| WaSeSS
    042
      
      
    a| lccopycat
    050
    0
    0
    a| TK7872.M3 b| E9862 2011
    082
    0
    0
    a| 621.36/6 2| 23
    245
    0
    0
    a| Extreme ultraviolet (EUV) lithography II h| [electronic resource] : b| 28 February-3 March 2011, San Jose, California, United States / c| Bruno M. La Fontaine, Patrick P. Naulleau, editors ; sponsored by SPIE ; cosponsored by Clymer, Inc..
    260
      
      
    a| Bellingham, Wash. : b| SPIE, c| c2011.
    490
    1
      
    a| Proceedings of SPIE, x| 0277-786X ; v| v. 7969
    500
      
      
    a| "SPIE advanced lithography" --Cover.
    504
      
      
    a| Includes bibliographical references and author index.
    538
      
      
    a| Mode of access: World wide Web.
    650
      
    0
    a| Extreme ultraviolet lithography v| Congresses.
    650
      
    0
    a| Ultraviolet radiation x| Industrial applications v| Congresses.
    650
      
    0
    a| Lasers x| Industrial applications v| Congresses.
    650
      
    0
    a| Photolithography v| Congresses.
    650
      
    0
    a| Optical coatings v| Congresses.
    655
      
    0
    a| Electronic books.
    700
    1
      
    a| La Fontaine, Bruno M.
    700
    1
      
    a| Naulleau, Patrick P. q| (Patrick Pascal)
    710
    2
      
    a| SPIE (Society)
    710
    2
      
    a| SPIE Conference Proceedings by volume
    830
      
    0
    a| Proceedings of SPIE--the International Society for Optical Engineering ; v| v. 7969.
    856
    4
    0
    u| http://RE5QY4SB7X.search.serialssolutions.com/?V=1.0&L=RE5QY4SB7X&S=JCs&C=TC0000629182&T=marc
    596
      
      
    a| 1
    999
      
      
    a| XX(6755620.1) w| WEB i| 6755620-1001 l| INTERNET m| UVA-LIB t| INTERNET

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