Item Details

Extreme Ultraviolet (EUV) Lithography [electronic resource]: 22-25 February 2010, San Jose, California, United States

Bruno M. La Fontaine, editor ; sponsored by SPIE ; cooperating organization SEMATECH Inc. (United States)
Format
EBook; Book; Online
Published
Bellingham, Wash. : SPIE, 2010.
Language
English
Series
Proceedings of SPIE
Proceedings of SPIE — the International Society for Optical Engineering
ISBN
9780819480507, 0819480509
Description
Mode of access: World wide Web.
Notes
  • "SPIE advanced lithography"--Cover.
  • Includes bibliographical references and author index.
Series Statement
Proceedings of SPIE, 0277-786X ; v. 7636
Proceedings of SPIE--the International Society for Optical Engineering ; v. 7636
Logo for Copyright Not EvaluatedCopyright Not Evaluated
Technical Details
  • Access in Virgo Classic

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