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Gate Stack and Silicide Issues in Silicon Processing: Symposium Held April 25-27, 2000, San Francisco, California, U.S.A.

editors L.A. Clevenger ... [et al.]
Format
Book
Published
Warrendale, Pa. : Materials Research Society, c2001.
Language
English
Series
Materials Research Society Symposium Proceedings
Materials Research Society Symposia Proceedings
ISBN
1558995196
Description
1 v. (various pagings) : ill. ; 24 cm.
Notes
Includes bibliographical references and indexes.
Series Statement
Materials Research Society symposium proceedings ; v. 611
Materials Research Society symposia proceedings v. 611
Technical Details
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    a| Gate stack and silicide issues in silicon processing : b| symposium held April 25-27, 2000, San Francisco, California, U.S.A. / c| editors L.A. Clevenger ... [et al.].
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    a| Warrendale, Pa. : b| Materials Research Society, c| c2001.
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    a| 1 v. (various pagings) : b| ill. ; c| 24 cm.
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    1
      
    a| Materials Research Society symposium proceedings ; v| v. 611
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    a| Includes bibliographical references and indexes.
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    650
      
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    a| Integrated circuits x| Ultra large scale integration x| Materials v| Congresses.
    650
      
    0
    a| Silicides v| Congresses.
    650
      
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    a| Gate array circuits v| Congresses.
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    a| Electric leakage v| Congresses.
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