Item Details

Run-to-Run Control in Semiconductor Manufacturing

edited by James Moyne, Enrique del Castillo, Arnon Max Hurwitz
Format
Book
Published
Boca Raton : CRC Press, 2001.
Language
English
ISBN
0849311780 (alk. paper)
Contents
  • Part 1 Foundation for Control
  • Chapter 1 Process Control in the Semiconductor Industry / Taber H. Smith, Duane S. Boning, James Moyne 15
  • Chapter 2 Process Control and Optimization Methods for Run-to-Run Application / Enrique Del Castillo, Arnon M. Hurwitz 45
  • Part 2 R2R Control Algorithms
  • Chapter 3 Basic R2R Control Algorithms / William Moyne 67
  • Chapter 4 Learning and Optimization Algorithms for an Optimizing Adaptive Quality Controller / Enrique Del Castillo 81
  • Chapter 5 An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Processes / Arnon M. Hurwitz, Enrique Del Castillo 91
  • Chapter 6 A Comparative Analysis of Run-to-Run Control Algorithms in the Semiconductor Manufacturing Industry / Zhe Ning, James Moyne, Taber Smith, Duane Boning, Enrique Del Castillo, Jinn-Yi Yeh, Arnon M. Hurwitz 101
  • Part 3 Integrating Control
  • Chapter 7 Existing and Envisioned Control Environment for Semiconductor Manufacturing / James Moyne, Joe White 115
  • Chapter 8 Design Requirements for an Integrative R2R Control Solution / James Moyne 125
  • Chapter 9 Generic Cell Controller / James Moyne 131
  • Chapter 10 Derivation of a Piggyback Run-to-Run Control Solution Design / James Moyne 165
  • Chapter 11 Integrated Run-to-Run Control Solution Examples / James Moyne 177
  • Chapter 12 Design and Optimization of an Optimizing Adaptive Quality Controller, Generic Cell Controller Enabled Solution / Enrique Del Castillo, Jinn-Yi Yeh, James Moyne, Victor Solakhian 191
  • Part 4 Customization Methodology
  • Chapter 13 Case Study: Furnace Capability Improvement Using a Customized Run-to-Run Control Solution / Arnon Hurwitz, James Moyne 203
  • Chapter 14 Process Recipe Optimization / Enrique Del Castillo 219
  • Chapter 15 Multizone Uniformity Control of a CMP Process Utilizing a Pre- and Postmeasurement Strategy / James Moyne, Chadi El Chemali, Kareemullah Khan, Rock Nadeau, Paul Smith, John Colt, Jonathan Chapple-Sokol, Tarun Parikh 231
  • Chapter 16 Control of Photolithography Alignment / Nital S. Patel, Robert Soper 249
  • Chapter 17 Age-Based Double EWMA Controller and Its Application to a CMP Process / Argon Chen, Ruey-Shan Guo 261
  • Part 6 Advanced Topics
  • Chapter 18 Advancements in Chemical Mechanical Planarization Process Automation and Control / James Moyne 279
  • Chapter 19 An Enhanced Exponentially Weighted Moving Average Controller for Processes Subject to Random Disturbances / Ruey-Shan Guo, Argon Chen, Jin-Jung Chen 289
  • Chapter 20 Enabling Generic Interprocess Multistep Control: the Active Controller / Nauman Chaudhry, James Moyne, Elke A. Rundensteiner 309.
Description
348 p. : ill. ; 24 cm.
Notes
Includes bibliographical references and index.
Technical Details
  • Access in Virgo Classic

  • LEADER 03912pam a22003734a 4500
    001 u3714699
    003 SIRSI
    005 20010312150710.0
    008 000719s2001 flua b 001 0 eng
    010
      
      
    a| 00059910
    020
      
      
    a| 0849311780 (alk. paper)
    035
      
      
    a| (Sirsi) i0849311780
    035
      
      
    a| (OCoLC)44634370
    040
      
      
    a| DLC c| DLC d| DLC d| MvI
    042
      
      
    a| pcc
    050
    0
    0
    a| TK7871.85 b| .R863 2001
    082
    0
    0
    a| 621.3815/2 2| 21
    090
      
      
    a| SCIENG/TK7871.85 b| .R863 2001
    245
    0
    0
    a| Run-to-run control in semiconductor manufacturing / c| edited by James Moyne, Enrique del Castillo, Arnon Max Hurwitz.
    260
      
      
    a| Boca Raton : b| CRC Press, c| 2001.
    300
      
      
    a| 348 p. : b| ill. ; c| 24 cm.
    504
      
      
    a| Includes bibliographical references and index.
    505
    0
    0
    g| Part 1 t| Foundation for Control -- g| Chapter 1 t| Process Control in the Semiconductor Industry / r| Taber H. Smith, Duane S. Boning, James Moyne g| 15 -- g| Chapter 2 t| Process Control and Optimization Methods for Run-to-Run Application / r| Enrique Del Castillo, Arnon M. Hurwitz g| 45 -- g| Part 2 t| R2R Control Algorithms -- g| Chapter 3 t| Basic R2R Control Algorithms / r| William Moyne g| 67 -- g| Chapter 4 t| Learning and Optimization Algorithms for an Optimizing Adaptive Quality Controller / r| Enrique Del Castillo g| 81 -- g| Chapter 5 t| An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Processes / r| Arnon M. Hurwitz, Enrique Del Castillo g| 91 -- g| Chapter 6 t| A Comparative Analysis of Run-to-Run Control Algorithms in the Semiconductor Manufacturing Industry / r| Zhe Ning, James Moyne, Taber Smith, Duane Boning, Enrique Del Castillo, Jinn-Yi Yeh, Arnon M. Hurwitz g| 101 -- g| Part 3 t| Integrating Control -- g| Chapter 7 t| Existing and Envisioned Control Environment for Semiconductor Manufacturing / r| James Moyne, Joe White g| 115 -- g| Chapter 8 t| Design Requirements for an Integrative R2R Control Solution / r| James Moyne g| 125 -- g| Chapter 9 t| Generic Cell Controller / r| James Moyne g| 131 -- g| Chapter 10 t| Derivation of a Piggyback Run-to-Run Control Solution Design / r| James Moyne g| 165 -- g| Chapter 11 t| Integrated Run-to-Run Control Solution Examples / r| James Moyne g| 177 -- g| Chapter 12 t| Design and Optimization of an Optimizing Adaptive Quality Controller, Generic Cell Controller Enabled Solution / r| Enrique Del Castillo, Jinn-Yi Yeh, James Moyne, Victor Solakhian g| 191 -- g| Part 4 t| Customization Methodology -- g| Chapter 13 t| Case Study: Furnace Capability Improvement Using a Customized Run-to-Run Control Solution / r| Arnon Hurwitz, James Moyne g| 203 -- g| Chapter 14 t| Process Recipe Optimization / r| Enrique Del Castillo g| 219 -- g| Chapter 15 t| Multizone Uniformity Control of a CMP Process Utilizing a Pre- and Postmeasurement Strategy / r| James Moyne, Chadi El Chemali, Kareemullah Khan, Rock Nadeau, Paul Smith, John Colt, Jonathan Chapple-Sokol, Tarun Parikh g| 231 -- g| Chapter 16 t| Control of Photolithography Alignment / r| Nital S. Patel, Robert Soper g| 249 -- g| Chapter 17 t| Age-Based Double EWMA Controller and Its Application to a CMP Process / r| Argon Chen, Ruey-Shan Guo g| 261 -- g| Part 6 t| Advanced Topics -- g| Chapter 18 t| Advancements in Chemical Mechanical Planarization Process Automation and Control / r| James Moyne g| 279 -- g| Chapter 19 t| An Enhanced Exponentially Weighted Moving Average Controller for Processes Subject to Random Disturbances / r| Ruey-Shan Guo, Argon Chen, Jin-Jung Chen g| 289 -- g| Chapter 20 t| Enabling Generic Interprocess Multistep Control: the Active Controller / r| Nauman Chaudhry, James Moyne, Elke A. Rundensteiner g| 309.
    596
      
      
    a| 5
    650
      
    0
    a| Semiconductors x| Design and construction.
    650
      
    0
    a| Semiconductor industry x| Production control.
    650
      
    0
    a| Electronic packaging.
    650
      
    0
    a| Production management.
    700
    1
      
    a| Moyne, James.
    700
    1
      
    a| Del Castillo, Enrique.
    700
    1
      
    a| Hurwitz, Arnon Max.
    999
      
      
    a| TK7871.85 .R863 2001 w| LC i| X004479258 l| STACKS m| SCI-ENG t| BOOK

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