Item Details

Surface Chemical Cleaning and Passivation for Semiconductor Processing

editors, Gregg S. Higashi, Eugene A. Irene, Tadahiro Ohmi
Format
Book
Published
Pittsburgh, PA : Materials Research Society, 1993.
Language
English
Series
Materials Research Society Symposium Proceedings
Materials Research Society Symposia Proceedings
ISBN
1558992138
Description
xi, 518 p. : ill. ; 24 cm.
Notes
  • Symposium Y held during the 1993 Spring Meeting of the Materials Research Society, held in San Francisco from April 13-15, 1993.
  • Includes bibliographical references and indexes.
Series Statement
Materials Research Society symposium proceedings ; v. 315
Materials Research Society symposia proceedings v. 315
Technical Details
  • Access in Virgo Classic

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    a| Surface chemical cleaning and passivation for semiconductor processing / c| editors, Gregg S. Higashi, Eugene A. Irene, Tadahiro Ohmi.
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    a| Pittsburgh, PA : b| Materials Research Society, c| 1993.
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    a| xi, 518 p. : b| ill. ; c| 24 cm.
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    1
      
    a| Materials Research Society symposium proceedings ; v| v. 315
    500
      
      
    a| Symposium Y held during the 1993 Spring Meeting of the Materials Research Society, held in San Francisco from April 13-15, 1993.
    504
      
      
    a| Includes bibliographical references and indexes.
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    a| 5
    650
      
    0
    a| Semiconductors x| Design and construction v| Congresses.
    650
      
    0
    a| Surface preparation v| Congresses.
    650
      
    0
    a| Semiconductors x| Cleaning v| Congresses.
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    0
    a| Surface chemistry v| Congresses.
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    a| Higashi, Gregg S.
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    a| Irene, Eugene A.
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    1
      
    a| Ōmi, Tadahiro, d| 1939-
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    a| Materials Research Society symposia proceedings v| v. 315.
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    a| Materials Research Society. b| Meeting d| (1993 : c| San Francisco, Calif.). b| Symposium Y.
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    a| TK7871.85 .S9155 1993 w| LC i| X002402379 l| STACKS m| SCI-ENG t| BOOK

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